Cleber Biasotto

Cleber Biasotto was born in Campinas, São Paulo, Brazil in 1976. He received the B.S. degree in electrical engineering from the Paulista University (UNIP), Campinas, São Paulo, Brazil in 2002, M.Sc. degree in electrical engineering (Microelectronics) from the State University of Campinas (UNICAMP), Campinas, São Paulo, Brazil in 2005, and PhD. degree in electrical engineering (Microelectronics) from Faculty of Electrical Engineering, Mathematics and Computer Science, within the Laboratory of Electronic Components, Technology and Materials of Delft Institute of Microelectronics and Submicron-technology, Delft University of Technology (TUDelft), Delft, The Netherlands in 2011. His master thesis concerned in obtaining and characterization the nitride, oxide and silicon oxynitride thin films deposited by high density plasma for application in Microelectromechanical Systems (MEMS), and his doctorate thesis concerned in develop a low temperature process for SiGe MOS based on SiGe dots for high speed devices. He received the second Ph.D. degree at UNICAMP in 2012. He was R&D Coordinator at Semikron Semiconductors Brazil from 2010 to 2013, Advanced Electronic Specialist at National Center for Advanced Electronic Technology (CEITEC S.A.) Semiconductors from 2013 to 2015, and Packaging Semiconductor Manager at Unitec Semicondutores S.A. from 2015 to 2017. Currently Pilot Line Engineer and Process Engineer at imec.

Cleber Biasotto was born in Campinas, São Paulo, Brazil in 1976. He received the B.S. degree in electrical engineering from the Paulista University (UNIP), Campinas, São Paulo, Brazil in 2002, M.Sc. degree in electrical engineering (Microelectronics) from the State University of Campinas (UNICAMP), Campinas, São Paulo, Brazil in 2005, and PhD. degree in electrical engineering (Microelectronics) from Faculty of Electrical Engineering, Mathematics and Computer Science, within the Laboratory of Electronic Components, Technology and Materials of Delft Institute of Microelectronics and Submicron-technology, Delft University of Technology (TUDelft), Delft, The Netherlands in 2011. His master thesis concerned in obtaining and characterization the nitride, oxide and silicon oxynitride thin films deposited by high density plasma for application in Microelectromechanical Systems (MEMS), and his doctorate thesis concerned in develop a low temperature process for SiGe MOS based on SiGe dots for high speed devices. He received the second Ph.D. degree at UNICAMP in 2012. He was R&D Coordinator at Semikron Semiconductors Brazil from 2010 to 2013, and now he is Avanced Electronic Specialist at CEITEC S.A. Semiconductors. His main interests are thin film deposition, high density plasma, high speed MOS devices, power device, IC module production, and microelectronic processing.